SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 454, Issue 1, 2000, Pages 778-782

Formation and stability of the Cu(110)+c(2×2)-Si surface alloy studied by high resolution XPS

(6) Rojas, C b Palomares, F J a Lopez M F c Goldoni, A d Paolucci, G d Martin Gago J A a

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b EPFL (Switzerland)

c DEPARTMENT OF PHYSICAL METALLURGY (Spain)

d SINCROTRONE TRIESTE (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INTERFACES (MATERIALS); MORPHOLOGY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

COPPER ALLOYS;

EID: 0033703850 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(00)00183-7 Document Type: Article

Times cited : (13)

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