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Volumn 558, Issue , 2000, Pages 149-154
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Substrate sensitivity of the adhesion and material properties of RF-PECVD amorphous carbon
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
AMORPHOUS MATERIALS;
ELECTRIC POTENTIAL;
ELECTRONIC PROPERTIES;
ELECTRONIC STRUCTURE;
GASES;
HYDROGENATION;
METALLIZING;
MIXTURES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SUBSTRATES;
THIN FILMS;
HYDROGENATED AMORPHOUS CARBON;
POTENTIAL VARIATION;
SUBSTRATE SENSITIVITY;
CARBON;
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EID: 0033703295
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (5)
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References (11)
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