Consideration of local shadowing and ion beam voltage effects in the prediction of a surface evolving under ion milling

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 166-175

  Klein, Eric J ^a  

^a University of Colorado at Boulder   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ELECTRIC POTENTIAL; MATHEMATICAL MODELS; PHOTORESISTS; SPUTTERING; SURFACES; THREE DIMENSIONAL;

ANGLE BEAM OF INCIDENCE; ION BEAM VOLTAGE EFFECTS; ION MILLING; LOCAL SHADOWING; PERMALLOY; SURFACE EVOLUTION;

ION BEAMS;

EID: 0033702854     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582133     Document Type: Article

References (2)

1. C. Catana, J. Colligon, and G. Carter, J. Mater. Sci. Lett. 7, 467 (1972).
2. J. Ducommun, M. Cantagrel, and M. Moulin, J. Mater. Sci. 10, 52 (1975).