Film formation behavior of the endohedral metallofullerene DY@C82

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 63-68

  Huang, Houjin ^a   Yang, Shihe ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; EVAPORATION; INTERFACES (MATERIALS); LANGMUIR BLODGETT FILMS; OXIDATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ENDOHEDRAL METALLOFULLERENE; FILM FORMATION BEHAVIOR;

DYSPROSIUM COMPOUNDS;

EID: 0033702763     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (25)

1. Y.S. Obeng, A.J. Bard, J. Am. Chem. Soc. 113, 6279 (1991).
2. T. Nakamura, H. Tachibana, M. Yumura, M. Matsumoto, R. Azumi, M. Tanaka, Y. Kawabata, Langmuir 8, 4 (1992).
3. R. Back, R.B. Lennox, J. Phys. Chem. 96, 8149 (1992).
4. J. Milliken, D.D. Domonguez, H.H. Nelson, W.R. Barger, Chem. Mater. 4, 252 (1992).
5. J. Guo, Y. Xu, Y. Li, C. Yang, Y. Yao, D. Zhu, C. Bai, Chem. Phys. Lett. 195, 625 (1992).
6. L.O. Bulhoes, Y.S. Obeng, A.J. Bard, Chem. Mater. 5, 110 (1993).
7. Y. Tomioka, M. Ishibashi, H. Kajiyama, Y. Taniguchi, Langmuir 9, 32 (1993).
8. D. Zhou, L. Gan, C. Luo, H. Tan, C. Huang, G. Yao, X. Zhao, Z. Liu, X. Xia, B. Zhang, J. Phys. Chem. 100 (1996) 3150;
9. D. Zhou, L. Gan, C. Luo, C. Huang, Y. Wu, Solid State Commun. 102, 891 (1997).
10. D.M. Guldi, Y. Tian, J.F. Fendler, H. Hungerbuhler, K.D. Asmus, J. Phys. Chem. 100, 2753 (1996).
11. H. Murakami, Y. Watanabe, N. Nakashima, J. Am. Chem. Soc. 118, 4484 (1996);
12. T. Nakanishi, H. Murakami, N. Nakashima, Chem. Lett. 12, 1219 (1998).
13. D.S. Bethune, R.D. Johnson, J.R. Salem, M.S. de Vries, C.S. Yannoni, Nature 366, 123 (1993).
14. J.R. Heflin, D. Marciu, C. Figura, S. Wang, P. Burbank, S. Stevenson, H.C. Dorn, Appl. Phys. Lett. 72, 2788 (1998).
15. G. Gu, H.J. Huang, S.H. Yang, P. Yu, J.S. Fu, G.K.L. Wong, X.G. Wan, J.M. Dong, Y.W. Du, Chem. Phys. Lett. 289, 167 (1998).
16. D.W. Cagle, S.J. Kennel, S. Mirzadeh, J.M. Alford, L.J. Wilson, Proc. Nat. Acad. Sci. Uni. Sta. Am. 96, 5182 (1999).
17. J.Q. Ding, L.T. Weng, S.H. Yang, J. Phys. Chem. 100, 11120 (1996);
18. J.Q. Ding, S.H. Yang, Angew. Chem. Int. Ed. Engl. 35, 2234 (1996).
19. N. Lin, H.J. Huang, S.H. Yang, N. Cue, J. Phys. Chem. A 102, 4411 (1998);
20. Phys. Rev. B-Cond. Matt. 58, 2126 (1998).
21. H. J. Huang, S. H. Yang, J. Organomet. Chem. in press (1999).
22. J.Q. Ding, S.H. Yang, Chem. Mater. 8, 2824 (1996).
23. H.J. Huang, S.H. Yang, J. Phys. Chem. B 102, 10196 (1998).
24. H.J. Huang, S.H. Yang, unpublished results (1999).
25. D.Y. Sun, H.J. Huang, S.H. Yang, Z.Y. Liu, and S.Y. Liu, Chem. Mater. 11, 1003 (1999).