Modification of negative auto-photosensitive polyimide

Journal of Applied Polymer Science

Volumn 77, Issue 4, 2000, Pages 943-947

  Li, Jia Shen ^a   Li, Zuo Bang ^a   Zhu, Pu Kun ^a  

^a HEBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL MODIFICATION; ELECTRIC PROPERTIES; LIGHT ABSORPTION; MOISTURE; MONOMERS; PHOTOSENSITIVITY; POLYCONDENSATION; SILICONES; STRUCTURE (COMPOSITION); ULTRAVIOLET RADIATION;

AROMATIC DIAMINE MONOMERS; AUTO PHOTOSENSITIVE POLYIMIDES; BENZOPHENONTETRACARBOXYLIC DIANHYDRIDE; MOISTURE ABSORPTION; ULTRAVIOLET ABSORPTION; ULTRAVIOLET ANALYSIS;

POLYIMIDES;

EID: 0033700922     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(20000725)77:4<943::AID-APP31>3.0.CO;2-G     Document Type: Article

References (9)

1. Li Z.; Zhu P.; Wang L. J Appl Polym Sci 1992, 44 1365.
2. Zhu P.; Li Z.; Feng W. J Appl Polym Sci 1995, 55, 1111.
3. Zhu P.; Li Z.; Feng W. J Appl Polym Sci 1997, 64,1463.
4. David C. R.; Enid K. S.; Peggy C. Polym Eng Sci 1996, 37, 2179.
5. Jpn. Pat. Disclosure 4-147 144, 1992.
6. Jpn. Pat. Disclosure 4-120 543, 1992.
7. Choi J. O.; Rosenfeld J. C.; Tyrell J. A.; Yang J. H. Polym Eng Sci 1992, 32, 1630.
8. Hiramoto H. Mater Res Soc Symp Proc 1990, 167, 87.
9. Rhode O.; Smolka P.; Falcigno P.; Pfeifer J Polym Eng Sci 1992, 32, 1623.