Effect of the hydrogen dilution on the local microstructure in hydrogenated amorphous silicon films deposited by radiofrequency magnetron sputtering

EPJ Applied Physics

Volumn 10, Issue 3, 2000, Pages 185-191

  Daouahi, M ^a   Zellama, K ^b   Bouchrih, H ^c   Elkaim, P ^d  

^a Struggle and Prevention   (Tunisia)

^b Universite de Picardie Jules Verne   (France)

^c FACULTÉ DES SCIENCES DE TUNIS   (Tunisia)

^d CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; HYDROGEN BONDS; HYDROGENATION; INFRARED RADIATION; LIGHT ABSORPTION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; RAMAN SCATTERING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

ELASTIC RECOIL DETECTION ANALYSIS;

AMORPHOUS FILMS;

EID: 0033700608     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2000131     Document Type: Article

References (0)