Basic imaging characteristics of phase edge lithography and impact of lens aberration on these

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Nakao, Shuji ^a   Kanai, Itaru ^a   Tsujita, Kouichirou ^a   Arimoto, Ichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COHERENT LIGHT; FOCUSING; IMAGE ANALYSIS; OPTICAL INSTRUMENT LENSES; OPTIMIZATION;

CRITICAL DIMENSION (CD); DEPTH OF FOCUS (DOF); PHASE EDGE LITHOGRAPHY; SPHERICAL ABERRATIONS;

PHOTOLITHOGRAPHY;

EID: 0033700363     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)