High density lithography using attenuated phase shift mask and negative resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 266-270

  Pau, S ^a   Cirelli, R ^a   Bolan, K ^a   Timko, A G ^a   Frackoviak, J ^a   Watson, G P ^a   Trimble, L E ^a   Blatchford, J W ^a   Nalamasu, O ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MASKS; PHOTORESISTS;

NEGATIVE PHOTORESISTS; PHASE SHIFT MASKS;

PHOTOLITHOGRAPHY;

EID: 0033699229     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389015     Document Type: Conference Paper

References (13)