Interaction of pattern orientation and lens quality on CD and overlay errors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 315-325

  Bukofsky, Scott ^a   Progler, Christopher ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ASPECT RATIO; COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; LENSES;

CRITICAL DIMENSION (CD);

PHOTOLITHOGRAPHY;

EID: 0033699039     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389020     Document Type: Conference Paper

References (6)