Modeling commercial MOCVD reactors: Role of complex chemistry models

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3944, Issue , 2000, Pages

  Mazumder, Sandip ^a   Lowry, Samuel A ^a  

^a CFD RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SEMICONDUCTING GALLIUM ARSENIDE;

PARASITIC DEPOSITION;

OPTOELECTRONIC DEVICES;

EID: 0033698247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)