Pattern asymmetry correction using assist patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 307-314

  Ryoo, Manhyoung ^a   Nam, Dongseok ^a   Cho, Hanku ^a   Moon, Jootae ^a   Lee, Sangin ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION;

ASSIST PATTERNS; OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0033697536     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389019     Document Type: Conference Paper

References (7)