Copper contamination induced degradation of MOSFET characteristics and reliability

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2000, Pages 26-29

  Inohara, M ^a   Sakurai, H ^a   Yamaguchi, T ^a   Tomita, H ^a   Iijima, T ^a   Oyamatsu, H ^a   Nakayama, T ^a   Yoshimura, H ^a   Toyoshima, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DEGRADATION; IMPURITIES; MOSFET DEVICES;

CARRIER TRAPS;

VLSI CIRCUITS;

EID: 0033697194     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)