Examination of the relationships between photoresist dissolution and diffusion characteristics, lithographic predictors, and simulated lithographic performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Hansen, Steven G ^a  

^a Arch Chemicals Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; DISSOLUTION;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0033692160     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)