Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 1056-1061

  Toriumi, Minoru ^a   Okabe, Ichiro ^a   Ohfuji, Takeshi ^a   Endo, Masayuki ^a   Morimoto, Hiroaki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; DIFFUSION IN SOLIDS; MOLECULAR DYNAMICS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; THERMAL EFFECTS;

CHEMICALLY AMPLIFIED RESISTS (CAR);

PHOTORESISTS;

EID: 0033691372     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388269     Document Type: Conference Paper

References (6)