CN spectroscopy and physico-chemistry in the boundary layer of a C/SiC tile in a low pressure nitrogen/carbon dioxide plasma flow

Journal of Chemical Physics

Volumn 112, Issue 23, 2000, Pages 10482-10490

  Boubert, P ^a   Vervisch, P ^a  

^a UNIVERSITÉ ET INSA DE ROUEN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CARBON; CARBON DIOXIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT EMISSION; MOLECULAR VIBRATIONS; NITROGEN; PLASMA FLOW; SILICON CARBIDE;

LOW PRESSURE NITROGEN/CARBON DIOXIDE PLASMA FLOW;

CERAMIC MATERIALS;

EID: 0033690068     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.481682     Document Type: Article

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