Techniques to print sub-0.2 μm contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 738-749

  Aramaki, K ^a   Hamada, T ^a   Lee, D K ^a   Okazaki, H ^a   Tsugama, N ^a   Pawlowski, G ^a  

^a SÜD CHEMIE AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; LIGHTING; MASKS; SHRINKAGE; THERMOANALYSIS; ULTRAVIOLET RADIATION;

DEEP-ULTRAVIOLET CONTACT HOLE PHOTORESISTS; HALFTONE PHASE-SHIFT MASKS; THERMAL FLOW PROCESSING;

PHOTORESISTS;

EID: 0033689553     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388360     Document Type: Conference Paper

References (7)