Lithographic performance of advanced, thin resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 1189-1197

  Williamson, Mike ^a   Neureuther, Andy ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; POLYMERS; SURFACE ROUGHNESS;

DENDRIMERS; ETCH RESISTANCE;

PHOTORESISTS;

EID: 0033689549     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388285     Document Type: Conference Paper

References (3)