1999 ITRS Metrology Roadmap and its implications for lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 2-10

  Diebold, Alain C ^a   Joy, David ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; SCANNING ELECTRON MICROSCOPY;

SCANNING ELECTRON MICROSCOPE CRITICAL DIMENSION MEASUREMENT (CD-SEM);

LITHOGRAPHY;

EID: 0033688889     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)