Miniaturization of electronics and its limits

IBM Journal of Research and Development

Volumn 44, Issue 1, 2000, Pages 84-88

  Keyes, Robert W ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DATA PROCESSING; INTEGRATED CIRCUIT MANUFACTURE;

ELECTRONIC COMPUTATION;

MICROELECTRONICS;

EID: 0033688337     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.441.0084     Document Type: Article

References (20)

1. E. W. Pugh, D. L. Critchlow, R. A. Henle, and L. A. Russell, "Solid State Memory Development in IBM," IBM J. Res. Develop. 25, 585-602 (1981).
2. J. M. Harker, D. W. Brede, R. E. Pattison, G. R. Santana, and L. G. Taft, "A Quarter Century of Disk File Innovation," IBM J. Res. Develop. 25, 677-689 (1981).
3. F. W. Voltmer, "Manufacturing Process Technology for VLSI," VLSI Electronics, Vol. 1, N. G. Einspruch, Ed., Academic Press, Inc., New York, 1981.
4. J. A. Swanson, "Physical versus Logical Coupling in Memory Systems," IBM J. Res. Develop. 4, 305-310 (1960).
5. R. Landauer, "Irreversibility and Heat Generation in the Computing Process," IBM J. Res. Develop. 5, 183-191 (1961); R. Landauer and J. W. F. Woo, "Minimal Energy Dissipation," J. Appl. Phys. 42, 2301-2308 (1971).
6. R. Landauer, "Irreversibility and Heat Generation in the Computing Process," IBM J. Res. Develop. 5, 183-191 (1961); R. Landauer and J. W. F. Woo, "Minimal Energy Dissipation," J. Appl. Phys. 42, 2301-2308 (1971).
7. R. Landauer, "Fluctuations in Bistable Tunnel Diode Circuits," J. Appl. Phys. 33, 2209-2216 (1962).
8. R. Landauer and J. A. Swanson, "Frequency Factors in the Thermally Activated Process," Phys. Rev. 121, 1668-1675 (1961).
9. C. H. Bennett, "Logical Reversibility of Computation," IBM J. Res. Develop. 17, 515-532 (1973).
10. R. Landauer, "Reversible Computation," Der Informationsbegriff in Technik und Wissenschaft, O. G. Folberth and C. Hackl, Eds., R. Oldenbourg, Munich, 1986, pp. 139-158.
11. A. M. Bobeck and E. Della Torre, Magnetic Bubbles. North-Holland Publishing Company, Amsterdam, 1975.
12. R. W. Keyes, "Trends in Bipolar Transistors," Research Report RC-12450, IBM Thomas J. Watson Research Center, Yorktown Heights, NY, 1987.
13. K.-U. Stein, "Status and Future Development of Microelectronic Technology," Elektrotech. Machinenbau 93, 240-248 (1976); R. W. Keyes, "Fundamental Limits in Digital Information Processing," Proc. IEEE 69, 267-278 (1981);
14. K.-U. Stein, "Status and Future Development of Microelectronic Technology," Elektrotech. Machinenbau 93, 240-248 (1976); R. W. Keyes, "Fundamental Limits in Digital Information Processing," Proc. IEEE 69, 267-278 (1981);
15. C. J. Myers, A. Y. C. Yu, and D. L. House, "Microprocessor Technology Trends," Proc. IEEE 74, 1605-1622 (1986).
16. S. Konishi, "A New Ultra-High-Density Solid State Memory: Bloch Line Memory," IEEE Trans. Magnetics MAG-19, 1838-1840 (1983).
17. W. Lenth and W. E. Moerner, "Gated Spectral Hole-Burning for Frequency Domain Optical Storage," Opt. Commun. 58, 249-254 (1986); W. E. Moerner and M. Levenson, "Single-Photon Processes for Frequency Domain Optical Storage," J. Opt. Soc. B 2, 915-924 (1985).
18. W. Lenth and W. E. Moerner, "Gated Spectral Hole-Burning for Frequency Domain Optical Storage," Opt. Commun. 58, 249-254 (1986); W. E. Moerner and M. Levenson, "Single-Photon Processes for Frequency Domain Optical Storage," J. Opt. Soc. B 2, 915-924 (1985).
19. W. P. Noble and W. W. Walker, "Fundamental Limitations on DRAM Storage Capacitors," IEEE Circ. & Dev. Mag. 1, 45-51 (January 1985).
20. S. Asai, "Semiconductor Memory Trends," Proc. IEEE 74, 1623-1635 (1986).