Novel resist material for sub-100 nm contact hole pattern

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Chung, Jeong Hee ^a   Choi, Sang Jun ^a   Kang, Yool ^a   Woo, Sang Gyun ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ETCHING; EXCIMER LASERS; PLASTIC COATINGS; PLASTIC FILMS;

CONTACT HOLE PATTERNS; THERMAL FLOW PATTERNS;

PHOTORESISTS;

EID: 0033687859     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)