Application of RF Discharges to sputtering

IBM Journal of Research and Development

Volumn 44, Issue 1-2, 2000, Pages 106-109

  Koenig, H R ^a   Maissei, L I ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; EQUIVALENT CIRCUITS; MAGNETIC FIELD EFFECTS; NEGATIVE IONS; POSITIVE IONS; PRESSURE EFFECTS; SPUTTERING; SUBSTRATES;

RADIO FREQUENCY DISCHARGES;

ELECTRIC DISCHARGES;

EID: 0033685950     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.441.0106     Document Type: Article

References (14)

1. J. K. Robertson antfC. W. Clapp, Nature 132, 479 (1933).
2. R. H. Hay, Can. J. Res. A16, 191 (1938).
3. J. I. Lodge and R. W. Stewart, Can. J. Res. A26, 205 (1948).
4. S. N. Levitskii, Sov. Phys.-Tech. Phys. 27, 913 (1957).
5. G. S. Anderson, W. N. Mayer and G. K. Wehner, J. Appl. Phys. 33, 2991 (1962).
6. G. K. Wehner, Adv. in Electron, and Electron. Phys. 7,239(1955).
7. P. D. Davidse and L. I. Maissel, 3rd Int. Vacuum Congress, Stuttgart 1965.
8. P. D. Davidse and L. I. Maissel, J. Appl. Phys. 37, 574 (1966).
9. P. D. Davidse, SCP and Solid State Technology, Dec. 1966, p. 36.
10. J. B. Hasted, Physics of Atomic Collision, Butterworth & Co. Ltd., London 1964.
11. J. S. Logan, IBM J. Res. Develop. 14, 172 (1970, this issue).
12. L. I. Maissel, R. E. Jones and C. L. Standley, IBM J. Res. Develop. 14, 176 (1970, this issue).
13. R. E. Jones, C. L. Standley and L. I. Maissel, J. Appl. Phys.3&,4656 (1967).
14. W. D. Davis and T. A. Vanderslice, Phys. Rev. 131, 219 (1963).