Real-time analysis of volatiles formed during processing of a chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Houle, Frances A ^a   Poliskie, G Michelle ^a   Hinsberg, William D ^a   Pearson, Dean ^a   Sanchez, Martha I ^a   Ito, Hiroshi ^a   Hoffnagle, John ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DEGASSING; DESORPTION; MASS SPECTROMETRY; PLASTIC COATINGS; PLASTIC FILMS; POLYSTYRENES; REACTION KINETICS; VOLATILE ORGANIC COMPOUNDS;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0033685588     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)