Adjustment of bilayer optical properties and the effect on imaging and etching performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Neisser, Mark ^a   Biafore, John ^a   Foster, Patrick ^a   Spaziano, Greg ^a   Sarubbi, Thomas ^a  

^a Arch Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; IMAGING SYSTEMS; LIGHT ABSORPTION; OPTICAL COATINGS;

BILAYER OPTICAL PROPERTIES; TOPOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033684951     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)