Impact of MEEF on low k1 lithography and mask inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Qian, Qi De ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ERROR ANALYSIS; MASKS; MATHEMATICAL MODELS;

CRITICAL DIMENSIONS (CD); MASK ERROR ENHANCEMENT FACTOR (MEEF); MASK INSPECTION SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0033684907     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)