Pulsed UV laser Raman and fluorescence spectroscopy of large area fused silica photomask substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 632-638

  Muehlig, Ch ^a   Bark Zollmann, S ^a   Grebner, D ^a   Triebel, W ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; EXCIMER LASERS; FLUORESCENCE; FUSED SILICA; HYDROGEN; LASER BEAM EFFECTS; MASKS; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY;

LASER-INDUCED FLUORESCENCE (LIF); PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 0033684531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389054     Document Type: Conference Paper

References (12)