Oriented graphitic carbon film grown by mass-selected ion beam deposition at elevated temperatures

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 305-310

  Kulik, J ^a   Lempert, G ^b   Grossman, E ^b   Lifshitz, Y ^b  

^a UNIVERSITY OF HOUSTON   (United States)

^b SOREQ NUCLEAR RESEARCH CENTER   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPRESSIVE STRESS; CRYSTAL ORIENTATION; DEPOSITION; ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; ION BEAMS; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

BIAXIAL STRESS; BRAGG DIFFRACTION; CARBON FILM; MASS SELECTED ION BEAM DEPOSITION; TRANSMISSION ELECTRON DIFFRACTION;

THIN FILMS;

EID: 0033684187     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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