SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 523-528

Amorphous carbon-silicon alloys prepared by a high plasma density source

(6) Ferrari, A C a Racine, B a,b Morrison, N A a Hutchings, I a Milne, W I a Robertson, J a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b Universite de Picardie Jules Verne (France)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CARBON; COMPOSITION; COMPOSITION EFFECTS; COMPRESSIVE STRESS; ELECTRON CYCLOTRON RESONANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON SILICON ALLOYS; BAND GAP; HYDROGENATED AMORPHOUS CARBON;

AMORPHOUS ALLOYS;

EID: 0033684019 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (2)

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