Mask error factor impact on the 130 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 594-601

  Randall, John ^a   Baum, Chris ^a   Kim, Keeho ^a   Mason, Mark ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; GATES (TRANSISTOR); IMAGING TECHNIQUES; MASKS; PHASE SHIFT; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

CRITICAL DIMENSIONS (CD); MASK ERROR FACTOR (MEF);

PHOTOLITHOGRAPHY;

EID: 0033683749     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389049     Document Type: Conference Paper

References (9)