Behavior of fused silica materials for microlithography irradiated at 193 nm with low-fluence ArF radiation for tens of billions of pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Morton, R G ^a   Sandstrom, R L ^a   Blumenstock, G M ^a   Bor, Zsolt ^a   Van Peski, C K ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FUSED SILICA; LASER PULSES; OPTICAL INSTRUMENT LENSES;

RAREFACTION PROCESSES;

PHOTOLITHOGRAPHY;

EID: 0033683083     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)