Thin amorphous silicon buffer process for suppression of W polymetal gate depletion in PMOS

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2000, Pages 74-75

  Ohtake, Fumio ^a   Akasaka, Yasushi ^a   Murakoshi, Atsushi ^a   Suguro, Kyoichi ^a   Nakanishi, Toshiro ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; GATES (TRANSISTOR); GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SUBSTRATES;

GATE DEPLETION;

MOS CAPACITORS;

EID: 0033682379     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)