0.20 μm CMOS technology with copper-filled contact and local interconnect

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2000, Pages 22-23

  Islam, R ^a   Venkatesan, S ^a   Woo, M ^a   Nagabushnam, R ^a   Denning, D ^a   Yu, K ^a   Adetutu, O ^a   Farkas, J ^a   Stephens, Tab ^a   Sparks, T ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC CONTACTS; TRANSISTORS;

DIFFUSION BARRIERS;

VLSI CIRCUITS;

EID: 0033682266     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)