Simulation of self-heating and contact resistance influences on nMOSFETs

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn , Issue , 2000, Pages 237-240

  Matsuzawa, K ^a   Kawashima, H ^a   Ouchi, K ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LATTICE CONSTANTS; PHONONS;

CONTACT RESISTANCE INFLUENCES; LATTICE HEAT EQUATION; SELF HEATING;

MOSFET DEVICES;

EID: 0033680867     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)