Integrated simulation of equipment and topography for plasma etching in the DRM reactor

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn , Issue , 2000, Pages 127-130

  Chung, Won Young ^a   Oh, Jae Joon ^a   Kim, Tai Kyung ^a   Shin, Jai Kwang ^a   Seo, Kang Ill ^a   Park, Young Kwan ^a   Kong, Jeong Taek ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER AIDED NETWORK ANALYSIS; COMPUTER SIMULATION; DRY ETCHING; ELECTRIC NETWORK SYNTHESIS; MAGNETIC FIELD EFFECTS; PLASMA ETCHING; SEMICONDUCTING SILICON;

DIPOLE RING MAGNET (DRM) REACTORS; HYBRID PLASMA EQUIPMENT MODEL (HPEM);

VLSI CIRCUITS;

EID: 0033679912     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)