Applications of MICP source for next generation photomask process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 218-225

  Kwon, Hyuk Joo ^a   Chang, Byung Soo ^a   Choi, Boo Yeon ^a   Park, Kyung Ho ^a   Jeong, Soo Hong ^a  

^a PKL   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DEFECTS; DRY ETCHING; ELECTRODES; ELECTRON CYCLOTRON RESONANCE; MASKS; PHOTORESISTS; PLASMA DENSITY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

CRITICAL DIMENSION UNIFORMITY; FACE DOWN LOADING; MULTIPLE INDUCTIVELY COUPLED PLASMA; PHOTOMASK PROCESS;

INTEGRATED CIRCUIT LAYOUT;

EID: 0033674794     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392028     Document Type: Conference Paper

References (4)