Development of halftone phase-shift blank and mask fabrication for ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 671-681

  Suda, Hideki ^a   Mitsui, Hideaki ^a   Nozawa, Osamu ^a   Ohtsuka, Hitoshi ^a   Takeuchi, Megumi ^a   Nishida, Naoki ^a   Ohkubo, Yasushi ^a   Ushida, Masao ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DURABILITY; GAS LASERS; INSPECTION; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT TESTING; LASER BEAM EFFECTS; LITHOGRAPHY; METALLIC FILMS; MOLYBDENUM COMPOUNDS; OPTICAL PROPERTIES; PHASE SHIFTERS; SPECIFICATIONS;

ARGON FLUORIDE LITHOGRAPHY; CHEMICAL DURABILITY; HALFTONE PHASE SHIFT MASK; IRRADIATION DURABILITY;

MASKS;

EID: 0033670449     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392099     Document Type: Conference Paper

References (9)