Process scheme for removing buffer layer on multilayer of EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 124-130

  Hoshino, Eiichi ^a   Ogawa, Taro ^a   Takahashi, Masashi ^a   Hoko, Hiromasa ^a   Yamanashi, Hiromasa ^a   Hirano, Naoya ^a   Chiba, Akira ^a   Ito, Masaaki ^a   Okazaki, Shinji ^a  

^a Solar Frontier KK   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; FABRICATION; HYDROFLUORIC ACID; MULTILAYERS; PHOTOLITHOGRAPHY; SILICA; SILICON WAFERS; SUBSTRATES; THICK FILMS;

BUFFER LAYER; EXTREME ULTRAVIOLET LITHOGRAPHY; SIDE ETCHING; WET ETCHING;

MASKS;

EID: 0033666584     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)