In situ study of dislocation behavior in columnar ai thin film on si substrate during thermal cycling

Materials Research Society Symposium - Proceedings

Volumn 594, Issue , 2000, Pages 123-128

  Allen, Charles W ^a   Schroeder, Herbert ^b   Hiller, Jon M ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c Madison Area Technical College   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTAL MICROSTRUCTURE; DISLOCATIONS (CRYSTALS); GRAIN GROWTH; IN SITU PROCESSING; POLYCRYSTALS; SILICON; SUBSTRATES; THERMAL CYCLING; TRANSMISSION ELECTRON MICROSCOPY;

PLANAR GLIDE PLANE ARRAYS;

THIN FILM CIRCUITS;

EID: 0033650777     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)

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