Constant-pressure molecular dynamics of amorphous Si

Physica Status Solidi (B) Basic Research

Volumn 217, Issue 1, 2000, Pages 461-471

  Urbassek, H M ^b   Klein, P ^a,b  

^a FRAUNHOFER INSTITUTE FOR INDUSTRIAL MATHEMATICS ITWM   (Germany)

^b Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033634055     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3951(200001)217:1<461::AID-PSSB461>3.0.CO;2-Z     Document Type: Article

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