Thermal flow sensor for liquids and gases based on combinations of two principles

Sensors and Actuators, A: Physical

Volumn 73, Issue 1-2, 1999, Pages 7-13

  Ashauer, M ^a   Glosch, H ^a   Hedrich, F ^a   Hey, N ^a   Sandmaier, H ^a   Lang, W ^a  

^a Hahn Schickard Gesellschaft   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANEMOMETERS; CALORIMETERS; FLOW MEASUREMENT; HEAT LOSSES; HEAT TRANSFER; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; TEMPERATURE MEASUREMENT; THERMOANALYSIS; THERMOPILES;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); MICROTHERMOTRANSFER PRINCIPLE; THERMAL FLOW SENSORS; THERMAL TIME-OF-FLIGHT (TOF);

CHEMICAL SENSORS;

EID: 0033537521     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00248-9     Document Type: Article

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