Characterization of laser ablated silicon thin films

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 102-108

  Vijayalakshmi, S ^a   Iqbal, Z ^b   George, M A ^c   Federici, J ^d   Grebel, H ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b HONEYWELL   (United States)

^c UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

^d NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Nanostructures; Raman scattering; Transmission electron microscopy (TEM); X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; LASER ABLATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER SCANNING MICROSCOPY (LSM);

SEMICONDUCTING FILMS;

EID: 0033534965     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01158-4     Document Type: Article

References (10)

1. S. Vijayalakshmi, M. George, H. Grebel, Appl. Phys. Lett. 70 (1997) 708.
2. S. Vijayalakshmi, F. Shen, H. Grebel, Appl. Phys. Lett. 71 (1997) 3332.
3. R. Jain, R. Lind, J. Opt. Soc. Am. 73 (1983) 647.
4. L. Banyai, S.Koch, Semiconductor Quantum Dots, World Scientific, Singapore, 1993.
5. H. Grebel, K. Fang, J. Appl. Phys. 77 (1995) 367.
6. Z. Iqbal, S. Veprek, J. Phys. C 15 (1982) 377.
7. M.A. George, et. al, J. Appl. Phys. 76 (1994) 4099.
8. O. Cullity, Elements of X-ray Diffraction, 2nd edn., Addison-Wesley, New York, 1978, Chapter 3.
9. Z. Iqbal, S. Veprek, A.P. Webb, P. Capezzuto, Solid State Commun. 37 (1981) 993.
10. S. Vijayalakshmi, H. Grebel, Z. Iqbal, C. White, J. Appl. Phys. 84 (1998) 6502.