Effect of precipitates on phase transformation behavior of Ti-49 at.% Ni film

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 305-308

  Luo, Haobin ^a   Shan, Fenglan ^a   Huo, Yanling ^a   Wang, Yuming ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Precipitate; Sputtering; Transission electron microscopy; X ray diffraction

Indexed keywords

ANNEALING; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MARTENSITIC TRANSFORMATIONS; MORPHOLOGY; NICKEL; PRECIPITATION (CHEMICAL); TITANIUM; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FACE-CENTERED-CUBIC STRUCTURES; HEXAGONAL-CLOSED-PACK STRUCTURES;

METALLIC FILMS;

EID: 0033534928     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01000-1     Document Type: Article

References (8)

1. S. Miyazaki, K. Otsuka, Metall. Trans. 17A (1986) 53.
2. D. Favier, Y. Liu, P.G. McCormick, Scripta Metall. 28 (1993) 669.
3. H.C. Lin, S.K. Wu, J.C. Lin, Mater. Chem. Phys. 37 (1994) 184.
4. J.D. Busch, A.D. Johnson, C.H. Lee, D.A. Stevenson, J. Appl. Phys. 68 (1990) 6224.
5. C.Y. Xie, L.C. Zhao, T.C. Lei, Scripta Metall. 23 (1989) 2131.
6. S. Miyazaki, Y. Igo, K. Otsuka, Acta Metall. 34 (1986) 2045.
7. A. Ishida, M. Sato, A. Takei, S. Miyazaki, Mater. Trans. JIM 36 (1995) 1349.
8. F. F. Gong, H.M. Chen, Y.N. Wang, Mater. Lett. 25 (1995) 13.