SiC film deposition by DC magnetron sputtering

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 42-44

  Gou, Li ^a   Qi, Changsong ^a   Ran, Junguo ^a   Zheng, Changqiong ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; FILM PREPARATION; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL VARIABLES MEASUREMENT; PRESSURE; SINTERING; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

RESISTANCE TEMPERATURE DEPENDENCE; SINTERED TARGET;

SILICON CARBIDE;

EID: 0033531822     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00070-X     Document Type: Article

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