GaAs photocathode cleaning by atomic hydrogen from a plasma source

Journal of Physics D: Applied Physics

Volumn 32, Issue 3, 1999, Pages 251-256

  Elamrawi, K A ^a   Elsayed Ali, H E ^a  

^a Old Dominion University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; HYDROCARBONS; HYDROGEN; OXIDES; PLASMA SOURCES; QUANTUM THEORY; SEMICONDUCTING GALLIUM ARSENIDE; SURFACES; VACUUM; ELECTRIC DISCHARGES; PHOTOEMISSION; PLASMAS;

ATOMIC HYDROGEN; ELECTRON AFFINITY; ULTRA HIGH VACUUM; NEGATIVE ELECTRON AFFINITY;

PHOTOCATHODES;

EID: 0033531292     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/3/012     Document Type: Article

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