Aluminum and silicon diffusion in Fe-Cr-Al alloys

Scripta Materialia

Volumn 40, Issue 5, 1999, Pages 517-522

  Heesemann, A ^a   Schmidtke, E ^a   Faupel, F ^a   Kolb Telieps, A ^b   Klower J ^b  

^a UNIVERSITY OF KIEL   (Germany)

^b KRUPP VDM GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINUM; COMPOSITION EFFECTS; INTERDIFFUSION (SOLIDS); OPTICAL MICROSCOPY; PHASE COMPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY ANALYSIS;

ELECTRON MICROPROBE ANALYSIS;

IRON ALLOYS;

EID: 0033524571     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(98)00498-9     Document Type: Article

References (6)

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3. J. L. Pouchou and F. Pichoir, La Recherche Aérospatiale, no. 1984-3; no. 1984-5, French and English editions.
4. J. Philibert, Atom Movements, Diffusion, and Mass Transport in Solids, Les Éditions de Physique, Les Ulis Cedex A (1991).
5. Landoldt-Börnstein, New Series, Group III, vol. 26, ed. H. Mehrer, Springer-Verlag, Berlin (1990).
6. Weinhagen M., Köhler B., Wolff J., Hehenkamp T. Defect Diffusion Forum. 143-147:1997;449.