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Volumn 480-481, Issue , 1999, Pages 557-561

Photochemical behavior under UVA radiation of β-cyclodextrin included Parsol® 1789 with a chemometric approach

Author keywords

Chemometrics; Encapsulation; Fluorescence Absorption spectroscopies; Photochemistry

Indexed keywords

AVOBENZONE; BETA CYCLODEXTRIN; SOLVENT; SUNSCREEN;

EID: 0033522551     PISSN: 00222860     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-2860(98)00822-9     Document Type: Conference Paper
Times cited : (18)

References (12)
  • 3
    • 0001862526 scopus 로고    scopus 로고
    • D.C. Neckers, D.H. Volman, G. von Bünau (Eds.), John Wiley & Sons, Inc, New York
    • P. Bortolus, S. Monti, in: D.C. Neckers, D.H. Volman, G. von Bünau (Eds.), Advances in Photochemistry, 21, John Wiley & Sons, Inc, New York, 1996 p. 1, 72.
    • (1996) Advances in Photochemistry , vol.21 , pp. 1
    • Bortolus, P.1    Monti, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.