In situ characterization of ultra-thin palladium deposits on α-and γ-alumina

Surface Science

Volumn 419, Issue 2-3, 1999, Pages 216-225

  Gillet, E ^a   El Yakhloufi, M H ^a,b   Disalvo, J P ^a   Ben Abdelouahab, F ^a,b  

^a Fac des Sci et Techniques   (France)

^b FACULTÉ DES SCIENCES   (Morocco)

Author keywords

Alumina; Palladium; Secondary ion mass spectroscopy; Work function measurements

Indexed keywords

ADSORPTION; ALUMINA; ELECTRONIC PROPERTIES; FILM GROWTH; MORPHOLOGY; SECONDARY ION MASS SPECTROMETRY; SURFACES; ULTRATHIN FILMS;

IN SITU CHARACTERIZATION; WORK FUNCTION MEASUREMENT;

PALLADIUM;

EID: 0033521388     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00796-1     Document Type: Article

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