Electrochemical preparation of metal microstructures on large areas of etched ion track membranes

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 149, Issue 1-2, 1999, Pages 207-212

  Dobrev, D ^a   Vetter, J ^a   Angert, N ^a  

^a GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

61.41.+e; 61.80.Jh; 81.65.Cf; 82.45.+z; Electrodeposition; Ion; Membrane; Metal; Microstructure; Track

Indexed keywords

COPPER; ELECTROCHEMISTRY; ELECTRODEPOSITION; ETCHING; MEMBRANES; MICROSTRUCTURE;

ETCHED ION TRACK MEMBRANES;

ION BOMBARDMENT;

EID: 0033518378     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00618-1     Document Type: Article

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