Ab initio molecular orbital study of the electron affinity of boron clusters

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 153, Issue 1-4, 1999, Pages 298-301

  Takeuchi, T ^a   Yamamoto, M ^a   Kiuchi, M ^b  

^a NARA WOMEN'S UNIVERSITY   (Japan)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; ION IMPLANTATION; NEGATIVE IONS; SPUTTERING;

CLUSTER; ELECTRON AFFINITY;

MOLECULAR DYNAMICS;

EID: 0033516071     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)01008-8     Document Type: Article

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