A method to grow silicon crystallites on glass

Journal of Crystal Growth

Volumn 198-199, Issue PART I, 1999, Pages 420-424

  Boeck, Torsten ^a   Teubner, Thomas ^a   Schmidt, Klaus ^a   Wilde, Peter Michael ^a  

^a LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

Author keywords

Artificial nucleation; Silicon on glass; Solar cells; Solution growth; Solvent droplets patterning

Indexed keywords

COALESCENCE; CRYSTAL GROWTH; ENCAPSULATION; GLASS; ION BEAMS; MICROANALYSIS; MORPHOLOGY; NUCLEATION; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SOLVENTS;

FOCUSED ION BEAM (FIB) METHOD; SOLVENT DROPLETS PATTERNING;

SEMICONDUCTING SILICON;

EID: 0033514738     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)01238-X     Document Type: Article

References (6)

1. T. Boeck, K. Schmidt, A. Braun, Verfahren zur Herstellung von kristallinen Schichten, 196 31 551.4, PCT/DE 96/01439, 26 July 1996.
2. H. Tanabe, K. Sera, K. Nakamura, K. Hirata, K. Yuda, F. Okumura, NEC Res. Dev. 35 (3) (1994).
3. N. Duhamel, B. Loisel, in: H.P. Strunk, J.H. Werner, B. Fortin, O. Bonnaud (Eds.), Solid State Phenomena, Polycrystalline Semiconductors III, vols. 37 and 38, Scitec Publications Ltd., Switzerland, 1994, p. 535.
4. T. Reindl, T. Fuska, C. Walz, H. Cerva, R. Lemme, W. Kruehler, M. Pauli, J. Mueller, in: H.P. Strunk, J.H. Werner, B. Fortin, O. Bonnaud (Eds.), Polycrystalline Semiconductors III, vols. 51 and 52, Scitec Publications Ltd., Switzerland, 1996, p. 295.
5. K. Yamagata, T. Yonehara, Appl. Phys. Lett. 61 (1992) 2557.
6. T. Yonehara, in: McConnell (Ed.), First NREL Conf., Future Generation Photovoltaic Technologies, CP404, 1-56396-704-9, The American Institute of Physics, New York, 1997.