Activation energy spectra for annealing of ion irradiation induced defects in silica glasses

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 221-226

  Van Dillen, T ^a   Brongersma, M L ^a   Snoeks, E ^a   Polman, A ^a  

^a FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

Activation energy; Defect annihilation; Ion irradiation; Silica glasses; Spectrum

Indexed keywords

ACTIVATION ENERGY; ANNEALING; BOROSILICATE GLASS; ION BEAMS; ION BOMBARDMENT; MATHEMATICAL MODELS; RADIATION DAMAGE; SPECTROSCOPIC ANALYSIS; STRESS ANALYSIS; VISCOSITY;

BINARY COLLISION MODEL; THERMAL SPIKE MODEL;

FUSED SILICA;

EID: 0033513854     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00884-2     Document Type: Article

References (14)

1. R.A.B. Devine, Nucl. Instr. and Meth. B 91 (1994) 378.
2. E. Snoeks, T. Weber, A. Cacciato, A. Polman, J. Appl. Phys. 78 (7) (1995) 4723.
3. M.L. Brongersma, E. Snoeks, A. Polman, Appl. Phys. Lett. 71 (12) (1997) 1628.
4. A. Benyagoub, S. Löffler, M. Rammensee, S. Klaumünzer, G. Saemann-Ischenko, Nucl. Instr. and. Meth. B 65 (1992) 228.
5. S. Klaumünzer, Radiât. Eff. Def. in Sol. 110 (1989) 79.
6. E. Snoeks, A. Polman, C.A. Volkert, Appl. Phys. Lett. 65 (19) (1994) 2487.
7. D.L. Griscom, G.H. Sigel Jr., R.J. Ginther, J. Appl. Phys. 47 (1976) 960.
8. 2, Ph.D. thesis, Utrecht University, ch. 2,3, 1998.
9. C.A. Volkert, J. Appl. Phys. 70 (7) (1991) 3521.
10. Some stress measurements (at certain temperatures between 95 and 580 K) were performed on the same sample using a procedure consisting of: stabilizing the temperature, ion irradiation to equilibrium stress and measuring the stress after switching off the ion beam.
11. M.R.J. Gibbs, I.E. Evetts, J.A. Leake, J. Mat. Science 18 (1983) 278.
12. W. Primak, Phys. Rev. 100 (6) (1955) 1677.
13. G.H. Vineyard, Rad. Eff. 29 (1976) 245.
14. E. Snoeks, P.O. Kik, A. Polman, Optical Mater. 5 (1996) 159.